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Copper-catalyzed trifluoromethylthiolation of aryl and vinyl boronic acids with a shelf-stable electrophilic trifluoromethylthiolating reagent
Alternative Title铜催化的芳基/烯基硼酸与一种稳定的亲电三氟甲硫基试剂的偶联反应研究
Kang K(康凯); Xu CF(徐春发); Shen QL(沈其龙)
2014
Source PublicationOrg. Chem. Front.
Volume1Pages:294-297
AbstractA new high yielding method for the preparation of a shelf-stable electrophilic trifluoromethylthiolating reagent, N-(trifluoromethylthio)phthalimide, is described. Reaction of this reagent with a variety of aryl and vinyl boronic acids in the presence of a copper catalyst generated the trifluoromethylthiolated arenes and alkenes in good to excellent yields.
Subject Area氟化学
DOI10.1039/c3qo00068k
URL查看原文
Language英语
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Document Type期刊论文
Identifierhttp://ir.sioc.ac.cn/handle/331003/38853
Collection中科院有机氟化学重点实验室
Corresponding AuthorShen QL(沈其龙)
Affiliation中科院上海有机化学研究所
Recommended Citation
GB/T 7714
Kang K,Xu CF,Shen QL. Copper-catalyzed trifluoromethylthiolation of aryl and vinyl boronic acids with a shelf-stable electrophilic trifluoromethylthiolating reagent[J]. Org. Chem. Front.,2014,1:294-297.
APA 康凯,徐春发,&沈其龙.(2014).Copper-catalyzed trifluoromethylthiolation of aryl and vinyl boronic acids with a shelf-stable electrophilic trifluoromethylthiolating reagent.Org. Chem. Front.,1,294-297.
MLA 康凯,et al."Copper-catalyzed trifluoromethylthiolation of aryl and vinyl boronic acids with a shelf-stable electrophilic trifluoromethylthiolating reagent".Org. Chem. Front. 1(2014):294-297.
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