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学科主题: 高分子化学 ; 氟化学
题名: A new low dielectric material with high thermostability based on a thermosetting trifluoromethyl substituted aromatic molecule
其他题名: 一种新型高热稳定性的含有三氟甲基芳基的低介电常数材料
作者: He FK(贺凤开) ; Yuan C(袁超) ; Li K(李凯) ; Diao S(刁屾) ; Jin KK(金凯凯) ; Wang JJ(王佳佳) ; Tong JW(童佳伟) ; Ma J(马娟) ; TONG JIAWEI ; MA JUAN ; Fang Q(房强)
通讯作者: 房强
刊名: RSC Adv.
发表日期: 2013
卷: 3, 期:45, 页:23128-23132
收录类别: SCI
部门归属: 中国科学院上海有机化学研究所
英文摘要: A thermally cross-linkable molecule composed of bis(trifluoromethyl) benzene and benzocyclobutene units (F1) was successfully prepared. Heating F1 (>200 degrees C) gave a cured resin, which showed a dielectric constant (k) of 2.47 at 30 MHz and an average
语种: 英语
相关网址: 查看原文
WOS记录号: WOS:000326395800060
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内容类型: 期刊论文
URI标识: http://ir.sioc.ac.cn/handle/331003/29276
Appears in Collections:高分子材料研究室_期刊论文

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Recommended Citation:
He FK,Yuan C,Li K,et al. A new low dielectric material with high thermostability based on a thermosetting trifluoromethyl substituted aromatic molecule[J]. RSC Adv.,2013,3(45):23128-23132.
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